Atomic Layer Deposition (ALD) Coatings

Atomic Layer Deposition Coating
Services for Electronics

Electronics are smaller and smarter than ever before. Deployed in new environments to fulfill new functions, these compact and capable components face new vulnerabilities that were once novel but are now typical: failure-inducing exposure to liquids, corrosives, harmful gases, pollution, salt, sweat, blood, contaminants, extreme temperatures, and intense electrical activity.

Atomic Layer Deposition molecules

To build a product that can reliably operate under these circumstances, it is often best to bolster these devices with thin-film coating protection. Sometimes, though, this can be more of a complex business decision.

What if you have a surface that is difficult to protect? Or a device with a complex shape that might be challenging to coat uniformly? Are your products miniaturized, creating a need for an even more lightweight, ultra-thin protection?

With years of research to validate, ALD is a coating material that has a proven process, providing meaningful benefits to businesses that need to deliver a sturdier, more reliable product. Atomic Layer Deposition (ALD) is a thin-film technology that can be applied to improve your products.



ALD, as a thin-film coating method, offers:

Nanometer Coverage

Higher accuracy of thickness control, at the nanometer scale.

Complex Conformality

Excellent conformality over complex 3-D structures.

Proven Protection

Dependable, pinhole-free conformal coatings.

What Is Atomic Layer Deposition?

Atomic layer deposition nano technology is an advanced thin-film protection method that can be used to enhance product development.

How Does ALD Work?

The ALD process is similar to chemical vapor deposition, but with ALD, film growth progresses layer by layer at the atomic level, creating coatings with precise thickness control. To serve this purpose for mass production, HZO is ramping up ALD technologies.

HZO Defender Series™

Our HZO Defender Series™ can use ALD to provide uniformity and control throughout the coating process. From industrial devices to consumer electronics, HZO’s conformal thin-film coatings hold promise across a range of industries.

What Are The Benefits of ALD Coatings?

Atomic layer deposition brings a variety of advantages to the table, including:

the HZO defender series logo

Exceptional Film Conformality

ALD demonstrates the ability to produce a uniform and pinhole-free film with tailored multiple layer deposition. These protective coatings are conforming, dense, crack-free, and defect-free.

Exemplary Control Over Film Thickness

The ALD process can deliver conformal thin-films with a precise thickness measured in nanometers, no matter how complex the components coated may be.

Excellent Repeatability

ALD coating services can produce consistent, reliable coating results that can easily be scaled to the desired requirements.

Other benefits include:

  • The ability to use non-toxic coating materials
  • Efficient use of materials
  • Ultra-low moisture and gas permeability even up to very high temperatures.

These benefits hold a meaningful impact across many industries, including the medical devices, automotive, IoT, and industrial verticals.

What Does ALD Protect Against?

Atomic layer deposition nano technology allows for the deposition of dense conformal films on substrates of smaller, more complex sizes and shapes. ALD films can be used to protect against:

  • Moisture
  • Radiation
  • Outgassing
  • Environmental threats
  • Unwanted oxidation and contamination

What’s The Atomic Layer Deposition Process?

Using the atomic layer deposition process, thin-films are crafted in cycles. The electronic component surface is exposed to the various vapors and gases in alternating, separated doses. During each coating period, a thin layer of material forms.

A reactive gas or vapor is pulsed into the chamber.
After forming a chemical bond with the substrate, the reactive vapor or gas will be purged from the chamber with a non-reactive gas.

A second reactive gas, chosen to complement the process, is pulsed into the chamber next at a precisely controlled amount.

This gas is purged from the chamber with the non-reactive gas again.
This deposition process continues until the coating is complete.

Atomic Layer Deposition Applications – Where is it Used?

Since it is possible to control the coating thickness down to a minute layer, ALD for thin-film deposition applications are often used to coat smaller parts and components that still hold up to the performance standards that your industry demands.

Why Choose ALD to Protect Your Electronic Devices?

You should choose an atomic layer deposition company if you:

  • Need reliable protection for smaller components
  • Want exact precise control of film thickness at the nanometer scale
  • Would like to take advantage of unique film compositions

Why Partner With HZO?

Trust HZO to Protect Your Product with ALD Coatings

From atomic layer deposition coating services to chemical vapor deposition to plasma-based polymerization, HZO only uses proven processes that you can trust. No matter what method you choose, when we get to work, the most exceptional people, processes, ALD technologies, equipment, and material science combine to offer a turnkey solution and prescriptive outcomes that you can depend on.

Want to know more? Contact us for a no-obligation quote to explore possibilities.

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